Increasing detectability in semiconductor foundry by multivariate statistical process control (Record no. 27063)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 02152naa a2200229uu 4500 |
| 001 - CONTROL NUMBER | |
| control field | 8071616112010 |
| 003 - CONTROL NUMBER IDENTIFIER | |
| control field | OSt |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20190211164018.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 080716s2008 xx ||||gr |0|| 0 eng d |
| 999 ## - SYSTEM CONTROL NUMBERS (KOHA) | |
| Koha Dewey Subclass [OBSOLETE] | PHL2MARC21 1.1 |
| 041 ## - LANGUAGE CODE | |
| Language code of text/sound track or separate title | eng |
| 100 1# - MAIN ENTRY--PERSONAL NAME | |
| Personal name | YANG, Chyan |
| 9 (RLIN) | 35024 |
| 245 10 - TITLE STATEMENT | |
| Title | Increasing detectability in semiconductor foundry by multivariate statistical process control |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Oxfordshire, UK : |
| Name of publisher, distributor, etc. | Taylor & Francis, |
| Date of publication, distribution, etc. | May-June 2008 |
| 520 3# - SUMMARY, ETC. | |
| Summary, etc. | Quality has become a key determinant of success in all aspects of modern industries. It is especially prominent in the semiconductor industry. This paper reviews the contributions of statistical analysis and methods to modern quality control and improvement. The two main areas are statistical process control (SPC) and experimentation. The statistical approach is placed in the context of recent developments in quality management, with particular reference to the total quality movement. |
| 520 3# - SUMMARY, ETC. | |
| Summary, etc. | In SPC, Hotelling T2 has been applied in laboratories with good result; however, it is rarely used in mass production, especially in the semiconductor industry. An advance process control (APC) of R&D study, involving Hotelling T2 and principal component analysis (PCA), is performed on a high density plasma chemical vapour deposition (HDP CVD) equipment in the 12-inch wafer fab. The design of experiment (DOE) of gas flow and RF power effects is used to work the feasibility of PCA for SPC and examine the correlation among tool parameters. In this work, the Hotelling T2 model is shown to be sensitive to variations as small as (+/ - )5% in the tool parameters. Compared with classical PDCA and qualitative analysis, applying statistical in process control is more effective and indeed necessary. This model also is especially suitable to the semiconductor industry |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | CHANG, Chao-Jung |
| 9 (RLIN) | 35025 |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | NIU, Han-Jen |
| 9 (RLIN) | 35026 |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | WU, Hsueh-Chang |
| 9 (RLIN) | 35027 |
| 773 08 - HOST ITEM ENTRY | |
| Title | Total quality management & business excellence |
| Related parts | 19, 5-6, p. 429-440 |
| Place, publisher, and date of publication | Oxfordshire, UK : Taylor & Francis, May-June 2008 |
| International Standard Serial Number | ISSN 14783363 |
| Record control number | |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Periódico |
| 998 ## - LOCAL CONTROL INFORMATION (RLIN) | |
| -- | 20080716 |
| Operator's initials, OID (RLIN) | 1611^b |
| Cataloger's initials, CIN (RLIN) | Tiago |
| 998 ## - LOCAL CONTROL INFORMATION (RLIN) | |
| -- | 20081209 |
| Operator's initials, OID (RLIN) | 1017^b |
| Cataloger's initials, CIN (RLIN) | Zailton |
No items available.
