000 02199naa a2200181uu 4500
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003 OSt
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008 100527s2009 xx ||||gr |0|| 0 eng d
100 1 _aAHMED, Arif
_940580
245 1 0 _aCreating opportunity from crisis :
_btaking a strategic and learning-focused perspective
260 _aBingley, UK :
_bEmerald,
_c2009
520 3 _aPurpose – The recession is forcing many businesses to downsize and in doing so they are losing valuable knowledge and skills. Arif Ahmed, co-founder & director of ikonami, examines how organizations can maintain their knowledge base and still remain competitive during difficult times. Design/methodology/approach – Approached positively, organizations can do more than passively survive this recession; they can re-evaluate their operations, pinpoint where they deliver value, and identify the knowledge, skills and abilities required by the optimum number of people to deliver the vision. Findings – HR needs to go back to basics, focusing on the fundamentals and moving to integrate learning into the broader management strategy. With money tight, decisions might need to be made as to whether to fund operational development to deliver immediate impact to the bottom line or longer-term talent management programmes. The recession is a great opportunity for organizational learning – if employees can deliver business success now that bodes well for the future, but it is important to capture the learning and lessons. HR and L&D managers must demonstrate the contribution they can make and earn their place at the strategic planning table. Originality/value – Approached positively, organizations can do more than passively survive this recession and prepare for the upturn; they can re-evaluate their operations, pinpoint where they deliver value, and identify the knowledge, skills and abilities required by the optimum number of people to deliver the vision.
773 0 8 _tDevelopment and Learning in Organizations
_g23, 5, p. 4-6
_dBingley, UK : Emerald, 2009
_xISSN 14777282
_w
942 _cS
998 _a20100527
_b1122^b
_cJaqueline
998 _a20100607
_b1019^b
_cCarolina
999 _aConvertido do Formato PHL
_bPHL2MARC21 1.1
_c33587
_d33587
041 _aeng